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 (511 ko) |
F.Arefi-Khonsari, N. Bauduin, F.Donsanti, J.Amouroux "Deposition of transparent conductive tin oxide thin films doped with fluorine by PACVD" Thin solid films (2002) |
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(521 ko) |
W.Morscheidt, K.Hassouni, N. Bauduin, F.Arefi-Khonsari, J.Amouroux "On the use of a global kinetics models for the investigation of energy deposition and chemistry in RF argon-oxygen plasmas working in the torr regime" Plasma Chemistry and Plasma Processing (2002) |
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W.Morscheidt, K.Hassouni, N. Bauduin, F.Arefi-Khonsari, J.Amouroux "Modeling and experimental study of an O2/Ar/ TMT discharge used for the deposition of transparent conductive thin Tin Oxide films " E-MRS 2002 Meeting, Strasbourg, June 18-21, 2002 |
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F.Arefi-Khonsari, N. Bauduin, F.Donsanti, J.Amouroux "Deposition of Transparent Conductive Tin Oxide thin films doped with fluorine by PACVD" E-MRS 2002 Meeting, Strasbourg, June 18-21, 2002 |
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(172 ko) |
N. Bauduin,
F. Arefi-Khonsari, J. Amouroux "Spectroscopic study of the energetic character of O2/Ar/Tetramethyltin discharge used for the deposition of transparent conductive thin tin oxide films" 15th International Symposium on Plasma Chemistry (ISPC), Orléans (2001) |
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(320 ko) |
N. Bauduin,
F. Arefi-Khonsari, J. Amouroux "Deposition of transparent conductive tin oxide films doped with fluorine by PACVD" 15th International Symposium on Plasma Chemistry (ISPC), Orléans (2001) |
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| W. Morscheidt,
K. Hassouni, N. Bauduin, F. Arefi-Khonsari, J. Amouroux "Kinetics nodels for the investigations of the effect of power deposition uniformity on R.F. argon-oxygen plasmas working in the torr regime" 15th International Symposium on Plasma Chemistry (ISPC), Orléans (2001) |
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(96 ko) |
M. Nikravech,
N. Bauduin, D. Morvan, J. Amouroux "Low pressure RF plasma shock wave reactor to synthetise and deposit Sr doped LaMnO3 thin layers for fuel cell applications" 15th International Symposium on Plasma Chemistry (ISPC), Orléans (2001) |
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(110 ko) |
F. Arefi-Khonsari,
N. Bauduin, J. Amouroux "Deposition of transparent tin oxide films: study of the energetic character of the discharge by a spectroscopy study" 14th Colloqium on Plasma Processes CIP2001 Antibes, p.117 (2001) |
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(110 ko) |
F. Arefi-Khonsari,
N. Bauduin, F. Hellegouarc’h, R. Planade, J. Amouroux " Deposition of transparent conductive tin oxide thin films by PECVD for sensor aplications" International Symposium on Plasma Chemistry (ISPC), Prague, Czech Republic (1999). ISPC 14 symposium proceedings vol III, p 1457 |
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(130 ko) |
W. Morscheidt,
K. Hassouni, N. Bauduin, J. Amouroux, F. Arefi-Khonsari "Modelling of chemical kinetics and energy transfer in O2/Ar discharges obtained under high frequency electric field " International Symposium on Plasma Chemistry (ISPC), Prague, Czech Republic (1999). ISPC 14 symposium proceedings vol II, p. 771-776 |
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(97 ko) |
F. Arefi-Khonsari,
N. Bauduin, F. Hellegouarc’h, R. Planade, J. Amouroux "Deposition of transparent conductive tin oxide thin films by PECVD for sensor applications" 12th Colloqium on Plasma Processes CIP’99 Antibes (1999) |
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| F. Hellegouarc’h,
N. Bauduin, F. Arefi-Khonsari, J Amouroux Journées couches minces, Société des électriciens et électroniciens, Ecole Polytechnique (1998) |
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